Equipment
Structure widths down to 0,6 µm on 4 inch substrates Suess Microtec MA4 © LS MNE / TU Dortmund Description: UV light exposure system, mask aligner Features: Structure widths down to 0,6 µm on 4 inch substrates [...] Features : Deben Beam Blanker, Kleindiek Nanotechnik Stage, Xenos Pattern Generator, Resolution down to 0,7nm In Cooperation with Terahertz Spectroscopy Group (AG Lange) Raith Pioneer © LS MNE / TU Dortmund [...] Unit (Range 1 aA - 100 mA, 1 µV - 200 V) Keithley 2635B Source Meter Unit Features: Source Meter Unit (0.1 fA - 10 A, 5 µV - 200 V) Keithley Nano-Voltmeter Features: Digital Nano-Voltmeter (< 1 µV - 100 V) …
